Crystals of black arsenic phosphorus --
exchanging phsphorus against arsenic, the band gap can be tuned to as
low as 0.15 eV, making the material predestined for long wavelength
infrared sensors.
Credit: Andreas Battenberg / TUM
Graphene, the only one atom thick carbon
network, achieved overnight fame with the 2010 Nobel Prize. But now
comes competition: Such layers can also be formed by black phosphorus.
Chemists at the Technische Universität München (TUM) have now developed a
semiconducting material in which individual phosphorus atoms are
replaced by arsenic. In a collaborative international effort, American
colleagues have built the first field-effect transistors from the new
material.
For many decades silicon has formed the basis of modern electronics.
To date silicon technology could provide ever tinier transistors for
smaller and smaller devices. But the size of silicon transistors is
reaching its physical limit. Also, consumers would like to have flexible
devices, devices that can be incorporated into clothing and the likes.
However, silicon is hard and brittle. All this has triggered a race for
new materials that might one day replace silicon.
Black arsenic phosphorus might be such a material. Like graphene,
which consists of a single layer of carbon atoms, it forms extremely
thin layers. The array of possible applications ranges from transistors
and sensors to mechanically flexible semiconductor devices. Unlike
graphene, whose electronic properties are similar to those of metals,
black arsenic phosphorus behaves like a semiconductor.
Phosphorene vs. graphene
A cooperation between the Technical University of Munich and the
University of Regensburg on the German side and the University of
Southern California (USC) and Yale University in the United States has
now, for the first time, produced a field effect transistor made of
black arsenic phosphorus. The compounds were synthesized by Marianne
Koepf at the laboratory of the research group for Synthesis and
Characterization of Innovative Materials at the TUM. The field effect
transistors were built and characterized by a group headed by Professor
Zhou and Dr. Liu at the Department of Electrical Engineering at USC.
The new technology developed at TUM allows the synthesis of black
arsenic phosphorus without high pressure. This requires less energy and
is cheaper. The gap between valence and conduction bands can be
precisely controlled by adjusting the arsenic concentration. "This
allows us to produce materials with previously unattainable electronic
and optical properties in an energy window that was hitherto
inaccessible," says Professor Tom Nilges, head of the research group for
Synthesis and Characterization of Innovative Materials.
Detectors for infrared
With an arsenic concentration of 83 percent the material exhibits an
extremely small band gap of only 0.15 electron volts, making it
predestined for sensors which can detect long wavelength infrared
radiation. LiDAR (Light Detection and Ranging) sensors operate in this
wavelength range, for example. They are used, among other things, as
distance sensors in automobiles. Another application is the measurement
of dust particles and trace gases in environmental monitoring.
A further interesting aspect of these new, two-dimensional
semiconductors is their anisotropic electronic and optical behavior. The
material exhibits different characteristics along the x- and y-axes in
the same plane. To produce graphene like films the material can be
peeled off in ultra thin layers. The thinnest films obtained so far are
only two atomic layers thick.
This work was supported by the Office of Naval Research (ONR), the
Air Force Office of Scientific Research (AFOSR), the Center of
Excellence for Nanotechnologies (CEGN) of King Abdul-Aziz City for
Science and Technology (KACST), the German Research Council (DFG) and
the TUM Graduate School.
Story Source:
The above post is reprinted from
materials provided by
Technical University of Munich (TUM).
Note: Materials may be edited for content and length.